Gencoa planar rectangular magnetrons combine low ownership cost, robust design and highly-optimized magnetics to produce a reliable product delivering high performance. Our rectangular magnetrons are in use in almost every type of industrial coating application including Semiconductor, architectural glass and display coating. A unique design incorporating 'zero-height' anodes prevent short circuits during processes and reduce dust and defects in the coatings. All sources incorporate rear flange plate cooling as standard and additional anode water cooling is optional. Depending on the application, Gencoa can configure individual cathodes to meet specific process requirements and limitations. An OEM proprietary magnetron design and manufacture service is also offered, and cathode CAD dimensional data can be downloaded in 2D and 3D formats using Gencoa's drawing generator (registration required).
Product category: Suppliers for the glass machinery industry
Gencoa's VTech range is available for target diameters of 2" to 6" and allow the magnetic properties over the target surface to be changed by simple external adjustment, which can be performed during the process or between deposition runs. Changes in the magnetic properties create different levels of strength and ion assistance to the coating process and allow rapid development of the thin film structures. The unique Vtech magnetron allows the variables of magnetic field properties of the source to create the following effects:
Unbalance Variable degree of unbalance to adjust the electron release and the level of ion bombardment of the growing film.
Balance To reduce the additional energy input to the growing film and substrate and produce low bombardment conditions.
Field Strength To vary the magnetic field strength in order to adjust the discharge voltage and current. This can be used to compensate for the change in discharge voltage as the sputter target erodes.
Gencoa's third generation range of small circular magnetrons - available in target diameters of 2" to 5" - includes ±45˚ tilt adjustment, gas injection and a rear utility box for DC, DC-pulsed, RF and HIPIMS processes as standard. The sources can be fitted with various magnetic and mechanical options, leading to performance benefits appropriate for differing applications, and are built to reliably work with DC, RF, pulsed DC and HiPIMS power supplies.
Key features Smallest footprint ± 45º tilt angle adjustment (1° accuracy) Standard target sizes High yield (HY) magnetics available for 4" and 5" target diameters Internal gas injection as standard Rear utility box as standard for RF and HIPIMS Easy target change and choice of target thickness (1-6mm) High strength magnetics for sputtering of magnetic material Indirect or direct target cooling (pre-configured)
Gencoa is a customer-focussed company providing expert solutions for the vacuum coating sector throughout the world. For more than twenty years, Gencoa has been perfecting its range of magnetron sputter cathodes and plasma deposition components, in addition to the introduction of process control and sensing products. In 2016, the company moved into its new purpose-built production and R&D facility in order to drive our business expansion and bring new innovations to the market.